| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern formation material cpable of forming a highly fine pattern having an excellent obtained resist face shape by regarding formation of a permanent pattern like a solder resist as an object and using a highly transparent substance as a support, and to provide a pattern formation apparatus provided with the pattern formation material and a permanent formation method using the pattern formation material. <P>SOLUTION: The pattern formation material has at least a photosensitive layer on a support and a haze value of the support is ≤5.0%. The photosensitive layer includes at least a binder, a polymerizable compound, a photopolymerization initiator, a heat cross-linking agent, and a hetero-fused ring compound. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
