| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus capable of making a uniform flow rate of a gas ejected toward a lower surface of a substrate to cause the substrate to float by a simple structure when holding the substrate in a horizontal posture without contact. SOLUTION: The apparatus includes an annular porous member 20 having fine pores to serve as air passages formed uniformly over the entire member, a stage 18 with the porous member 20 integrally fixed, having a flat surface of the member exposed on the upper surface and a gas supply path 26 communicating with part of the porous member formed inside, and a gas supply means for supplying the gas to the porous member 20 through the gas supply path 26 of the stage 18. The gas is supplied to the porous member 20 and ejected upward from the surface of the member, causing the substrate W to float immediately above the stage 18 to be held without contact. COPYRIGHT: (C)2006,JPO&NCIPI |
