Deposition of a thin coating on a substrate surface, using plasma enhanced atomic layer deposition, has a pause between process and reactive gas feeds and a further pause for a plasma to be generated

摘要

To form a thin coating layer on the surface of a substrate, there is a time shift in the cycled feed of process gases (1,2) into a reaction zone with an interruption (5) between them followed by a further pause (4) while a plasma (3) is generated. The process gas and process temperature are selected so that there is a reaction only when a plasma is generated. The plasma generation is delayed until the start of a break in the process gas delivery. The process gas can be hexamethyl disoloxane or tetraisopropyl orthotitanate, with oxygen as a reactive gas.