| 摘要 |
A structure and method of fabrication are disclosed for improving surface passivation of III-V compound semiconductors. The invention exploits certain anion-rich compound semiconductors to form a high quality interface with a dielectric when anion mobility is increased during an annealing step. Low post-annealing surface state densities result in a low fixed charge density at the interface and low surface recombination velocities. The invention enables microelectronic devices including diode, transistor, solar cell, photodetector, and CCDs with superior performance wherever prior art devices have inferior surface passivation.
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