| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently manufacture a photoresist resin very soluble in a solvent for resists on an enlarged industrial scale. <P>SOLUTION: The manufacturing method of the photoresist resin comprises adding dropwise a solution of monomers and a polymerization initiator into a polymerization system to give the photoresist resin comprising at least a recurring unit A containing a group a part of which is eliminated by an acid to become alkali-soluble and a recurring unit B containing a polar group-bearing alicyclic skeleton in an amount of at least 10 kg per one batch, where a polymerization solvent is previously charged in a polymerization vessel in such an amount that the substantial heat transfer area is at least 200 cm<SP>2</SP>/kg based on the volume of the solution added dropwise in an hour, and the dropwise addition of the solution of the monomers and the polymerization initiator is started after the temperature is raised. The temperature in the polymerization system can be set 1-5°C higher than the control temperature at the time of polymerization before the initiation of the dropwise addition of the solution of the monomers and the polymerization initiator and set to the control temperature at the time of polymerization after the initiation of the dropwise addition. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
