发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
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申请公布号 |
EP1677154(A2) |
申请公布日期 |
2006.07.05 |
申请号 |
EP20050257742 |
申请日期 |
2005.12.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER WIJST, MARC WILHELMUS MARIA;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS;LOOPSTRA, ERIK ROELOF;RAVENSBERGEN, MARIUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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