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发明名称
METHOD FOR FORMING GATE OF SEMICONDUCTOR
摘要
申请公布号
KR20060077766(A)
申请公布日期
2006.07.05
申请号
KR20040117299
申请日期
2004.12.30
申请人
HYNIX SEMICONDUCTOR INC.
发明人
YOO, MIN SOO
分类号
H01L21/8242;H01L21/336
主分类号
H01L21/8242
代理机构
代理人
主权项
地址
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