POLISHING CLOTH AND METHOD FOR ATTACHING/DETACHING THE POLISHING CLOTH TO/FROM POLISHING MACHINE BASE PLATE

摘要

A POLISHING CLOTH INCLUDES : A POLISHING CLOTH SUBSTRATE ; A FIRST PRESSURE-SENSITIVE LAYER FORMED ON A BACK FACE OF THE POLISHING CLOTH SUBSTRATE; A SUPPORT FORMED ON A BACK FACE OF THE FIRST PRESSURE-SENSITIVE ADHESIVE LAYER; A SECOND PRESSURE-SENSITIVE ADHESIVE LAYER FORMED ON A BACK FACE OF THE SUPPORT; AND A RELEASE SHEET RELEASABLY ATTACHED TO THE SECOND PRESSURE-SENSITIVE ADHESIVE LAYER. THE SECOND PRESSURE-SENSITIVE ADHESIVE LAYER INCLUDES AN ADHESIVE COMPOSITION.THE ADHESIVE COMPOSITION CONTAINS A PRESSURE-SENSITIVE ADHESIVE AND A SIDE-CHAIN CRYSTALLIZABLE POLYMER SO THAT THE SIDE-CHAIN CRYSTALLIZABLE POLYMER IS PRESENT IN AN AMOUNT OF ABOUT 1% TO ABOUT 30% BY WEIGHT BASED ON THE ADHESIVE COMPOSITION. THE SIDE-CHAIN CRYSTALLIZABLE POLYMER INCLUDES AS A MAIN COMPONENT THEREOF AN ACRYLIC ACID ESTER AND/OR METHACRYLIC ACID ESTER WHICH HAS A STRAIGHT-CHAIN ALKYL GROUP INCLUDING 16 OR MORE CARBON ATOMS AS A SIDE CHAIN.FIG.1