发明名称 FED having polycrystalline silicon film emitters and method of fabricating polycrystalline silicon film emitters
摘要 An FED using polycrystalline silicon film emitters has a substrate divided into a plurality of pixel regions, a plurality of polycrystalline silicon film emitters disposed within the pixel regions of the substrate, a cathode layer disposed on the substrate, a faceplate disposed above the substrate, and an anode layer disposed between the substrate and the faceplate.
申请公布号 US2006138936(A1) 申请公布日期 2006.06.29
申请号 US20050305633 申请日期 2005.12.16
申请人 CHEN DIN-GUO;SUN JENG-HUNG;HO SHYUAN-JENG 发明人 CHEN DIN-GUO;SUN JENG-HUNG;HO SHYUAN-JENG
分类号 H01J63/04;H01J1/62 主分类号 H01J63/04
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