发明名称 |
Lithographic apparatus and device manufacturing method utilizing a substrate handler |
摘要 |
A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
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申请公布号 |
US2006139616(A1) |
申请公布日期 |
2006.06.29 |
申请号 |
US20050157201 |
申请日期 |
2005.06.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JACOBS HERNES;VAN DER SCHOOT HARMEN K.;VOSTERS PETRUS M.H.;LUTTIKHUIS BERNARDUS A.J. |
分类号 |
G03B27/32;G03B27/62 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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