发明名称 Lithographic apparatus and device manufacturing method utilizing a substrate handler
摘要 A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
申请公布号 US2006139616(A1) 申请公布日期 2006.06.29
申请号 US20050157201 申请日期 2005.06.21
申请人 ASML NETHERLANDS B.V. 发明人 JACOBS HERNES;VAN DER SCHOOT HARMEN K.;VOSTERS PETRUS M.H.;LUTTIKHUIS BERNARDUS A.J.
分类号 G03B27/32;G03B27/62 主分类号 G03B27/32
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