发明名称 CHARGED PARTICLE BEAM EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide charged particle beam equipment that does not cause positional misalignment at sample placement. SOLUTION: This equipment comprises a sample hold table on a pedestal and a sample exchange room equipped with a means for loading samples including wafers onto the sample hold table or unloading them from that table. When the above-mentioned samples are loaded onto the sample hold table, air in an interfce is removed between the sample and the sample hold table is removed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006173445(A) 申请公布日期 2006.06.29
申请号 JP20040365769 申请日期 2004.12.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TSUNODA MASAHIRO;SHUDO TORU;ABE HIDETAKA
分类号 H01L21/027;H01J37/20 主分类号 H01L21/027
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