发明名称 |
CHARGED PARTICLE BEAM EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide charged particle beam equipment that does not cause positional misalignment at sample placement. SOLUTION: This equipment comprises a sample hold table on a pedestal and a sample exchange room equipped with a means for loading samples including wafers onto the sample hold table or unloading them from that table. When the above-mentioned samples are loaded onto the sample hold table, air in an interfce is removed between the sample and the sample hold table is removed. COPYRIGHT: (C)2006,JPO&NCIPI
|
申请公布号 |
JP2006173445(A) |
申请公布日期 |
2006.06.29 |
申请号 |
JP20040365769 |
申请日期 |
2004.12.17 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
TSUNODA MASAHIRO;SHUDO TORU;ABE HIDETAKA |
分类号 |
H01L21/027;H01J37/20 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|