发明名称 COAT/DEVELOP MODULE WITH SHARED DISPENSE
摘要 <p>An apparatus for dispensing fluid during semiconductor substrate processing operations. The apparatus includes a central fluid dispense bank comprising a plurality of dispense nozzles coupled to a plurality of fluid sources and a first processing chamber positioned to a first side of the central fluid dispense bank. The apparatus also includes a second processing chamber positioned to a second side of the central fluid dispense bank and a dispense arm adapted to translate between the central fluid dispense bank, the first processing chamber, and the second processing chamber.</p>
申请公布号 WO2006069348(A2) 申请公布日期 2006.06.29
申请号 WO2005US46906 申请日期 2005.12.21
申请人 APPLIED MATERIALS, INC.;ISHIKAWA, TETSUYA;ROBERTS, RICK, J. 发明人 ISHIKAWA, TETSUYA;ROBERTS, RICK, J.
分类号 B05D5/00 主分类号 B05D5/00
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