| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate retaining device and a substrate retaining method capable of attracting and retaining favorably the substrate with warpage generated therein to a retaining plate in a substantially flat state, and a substrate heating device capable of effecting favorably the heating treatment of a resist or the like applied on the substrate. SOLUTION: The substrate heating device is provided with a retaining table 21 for retaining the substrate 1, a heating means for heating the retaining table 21, and an attracting means for attracting the substrate 1 onto the retaining table 21. When the substrate 1 with warpage generated therein is disposed on the retaining table 21 heated by the heating means, the attracting means 28 attracts and retains a plurality of regions of the substrate 1 in different timing respectively in accordance with the reducing amount of the warpage of the substrate 1 caused by the heat of the retaining table 21. COPYRIGHT: (C)2006,JPO&NCIPI |
