| 摘要 |
<p>A remote control center (12) controls and monitors a plurality of wells. A surface control and monitoring system (20) is located at each of the wells (14), and each of the surface control and monitoring systems is in communication with a remote control center. Also, a down hole monitoring and control system is provided within each of the wells, and each of the down hole monitoring and control systems (22) is in communication with at least one of the surface control and monitoring systems. Each of the down hole monitoring and control systems comprises non-cooled, high temperature electronic equipment that can withstand the high temperature environment within the corresponding well.</p> |
