| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. <P>SOLUTION: The lithographic apparatus for making a visibility of artifact in a pattern small is provided. The lithographic apparatus comprises a lighting system, a pattern forming apparatus, a projecting system, and a modulating apparatus. A beam of radiation is supplied by the lighting system, and the beam is processed in pattern forming by the pattern forming apparatus. The beam is projected to a target portion by the projecting system. A pattern preparing a modulating scheme is given in such a way that the beam is modulated by the modulating apparatus. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
