| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transfer apparatus and transfer method by which a pattern can be transferred onto the second plane of a substrate so as to correspond to a pattern on the first plane of the substrate, and also to provide an inspection device by which a region on the second plane of the substrate corresponding to a region on the first plane can be observed. <P>SOLUTION: The transfer apparatus comprises (A) a transfer means for transferring a second pattern onto the second plane of the substrate 30, (B) a holding base 21 to place and hold the substrate with the first plane of the substrate in contact with the holding base, (C) a detection means for detecting an alignment mark formed on the first plane of the substrate from the holding base side, and (D) a control means 25. The control means (a) finds the coordinates values of the reference point of the substrate based on the alignment mark detected by the detection means, and (b) controls the relative position between the transfer means and the substrate using the coordinates values of the reference point of the substrate so that the second pattern to be transferred by the transfer means may correspond to the first pattern formed on the first plane of the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
