发明名称 |
LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment which can efficiently seal a liquid between different regions of a substrate table. <P>SOLUTION: The substrate table is provided with a cover plate 100 which is arranged above a main body MB of the substrate table. The cover plate 100 which has is a flat and continuous upper surface can be applied to a local region type liquid feed system. The upper surface of the cover plate 100 is approximately the same plane as the upper surface of a substrate W. A sealing projection 200 may be formed to reduce or prevent liquid to enter a recess between a substrate support SS and the main body MB of the substrate table. The sealing projection 200 connects the interior edge of the cover plate 100 and the upper surface of the substrate support SS. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006165572(A) |
申请公布日期 |
2006.06.22 |
申请号 |
JP20050353110 |
申请日期 |
2005.12.07 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
MARIA HENNUS PIETER R;MERTENS JEROEN JOHANNES SOPHIA MARIA;CORNELUS HENDRIK SMULDERS PATRICK J;SMITS PETER |
分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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