| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dressing method of a grinding pad capable of dressing without damaging and polluting the grinding pad. <P>SOLUTION: This dressing method of the grinding pad on a grinding device 10 works by making a work W contact with the grinding pad 50 while supplying slurry. In this case, dressing of the grinding pad is carried out by pressurizing a pad dresser 60 on the grinding pad 50, making washing liquid into fog particles of 1μm-500μm in particle diameter and jetting the washing liquid particles toward the grinding pad from a nozzle 14 at a speed of 10m/sec-500m/sec. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
