发明名称 METHOD OF FORMING CERAMIC THIN FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of forming a ceramic thin film made dense by being fired at a temperature lower than conventional one. <P>SOLUTION: A sintering auxiliary agent in an auxiliary agent layer 20 diffuses to a 1st ceramic material layer 18 and a 2nd ceramic material layer 22. The sintering of the ceramic material layers is prompted by the sintering auxiliary agent. Because the whole of the auxiliary agent layer 20 is covered with a 2nd ceramic material layer 22 and does not locate on the surface layer part, the volatilization of the sintering auxiliary agent is suitably suppressed to enhance the prompting effect. The sintering is prompted only by the diffusion from the auxiliary agent layer20 because of being thin in the film thickness of the 1st ceramic material layer 18 and the 2nd ceramic material layer 22. Because the 1st ceramic material layer 18 and the 2nd ceramic material layer 22 do not contain the sintering auxiliary agent, pores caused by the volatilization of the sintering auxiliary agent are not formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006160590(A) 申请公布日期 2006.06.22
申请号 JP20040358600 申请日期 2004.12.10
申请人 NORITAKE CO LTD 发明人 KAWAHARA AKIHIRO;TAKAHASHI YOSUKE
分类号 C04B35/622;C04B35/48;C04B35/50;C23C26/00;H01M8/02 主分类号 C04B35/622
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