发明名称 |
Photomask and method for maintaining optical properties of the same |
摘要 |
A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface. A pattern is formed in the absorber layer to create a photomask for use in a semiconductor manufacturing process. A transmissive protective layer is also formed on at least one of the patterned layer and the second surface of the substrate. The protective layer reduces haze growth when the photomask is used in the semiconductor manufacturing process.
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申请公布号 |
US2006134534(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20060349438 |
申请日期 |
2006.02.07 |
申请人 |
DIEU LAURENT;GORDON JOSEPH S;JOHNSTONE ERIC V;CHOVINO CHRISTIAN |
发明人 |
DIEU LAURENT;GORDON JOSEPH S.;JOHNSTONE ERIC V.;CHOVINO CHRISTIAN |
分类号 |
B08B7/00;A61N5/00;B08B3/12;B08B6/00;B08B7/02;G03C5/00;G03F;G03F1/00;G03F1/14;G03F9/00;G21G5/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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