发明名称 |
Semiconductor manufacturing apparatus, liquid container, and semiconductor device manufacturing method |
摘要 |
A semiconductor manufacturing apparatus comprises a discharge portion discharging a coating liquid onto a substrate; a gas supply tube supplying an inert gas into a liquid container that contains the coating liquid, and pressurizing an interior of the liquid container; a coating liquid supply tube airtightly supplying the coating liquid from the liquid container to the discharge portion using pressurization from the gas supply tube; a first connecting portion capable of attaching and detaching the liquid container to and from the coating liquid supply tube; a second connecting portion capable of attaching and detaching the liquid container to and from the gas supply tube; and a solvent supply tube supplying a solvent, which can dissolve the coating liquid, to the first connecting portion.
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申请公布号 |
US2006134928(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20050246145 |
申请日期 |
2005.10.11 |
申请人 |
ARISUMI OSAMU;KIYOTOSHI MASAHIRO;HIEDA KATSUHIKO |
发明人 |
ARISUMI OSAMU;KIYOTOSHI MASAHIRO;HIEDA KATSUHIKO |
分类号 |
H01L21/469;B05C5/00 |
主分类号 |
H01L21/469 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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