发明名称 Method of producing a diffraction grating
摘要 In an embodiment, a method of producing a diffraction grating comprises steps of: forming, on a man surface of a first member, a first mask having a plurality of resist patterns arranged at a Bragg diffraction period; etching the first member by use of the first mask, thereby providing the first member with a diffraction grating; removing the first mask; forming, on the diffraction grating, a second member of which an etching rate is lower than that of the first member; forming a second mask on a first region in a surface of the second member, the first region and a second region in the surface being adjacent to each other; and etching the first member and the second member by use of the second mask.
申请公布号 US2006134815(A1) 申请公布日期 2006.06.22
申请号 US20050296853 申请日期 2005.12.08
申请人 KISHI TAKESHI 发明人 KISHI TAKESHI
分类号 H01L21/00 主分类号 H01L21/00
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