METHOD AND DEVICE FOR SIMULATION, METHOD AND DEVICE FOR POLISHING, METHOD AND DEVICE FOR PREPARING CONTROL PARAMETER OR CONTROL PROGRAM, POLISHING SYSTEM, RECORDING MEDIUM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,申请号KR20047002372-传众专利搜索

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发明名称	METHOD AND DEVICE FOR SIMULATION, METHOD AND DEVICE FOR POLISHING, METHOD AND DEVICE FOR PREPARING CONTROL PARAMETER OR CONTROL PROGRAM, POLISHING SYSTEM, RECORDING MEDIUM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100590465(B1)	申请公布日期	2006.06.19
申请号	KR20047002372	申请日期	2002.08.19
申请人		发明人
分类号	G01B21/02;H01L21/304;B24B37/00;B24B51/00;B24B57/02	主分类号	G01B21/02
代理机构		代理人
主权项
地址

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