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发明名称
GATE PATTERN FORMING METHOD USING ARF PHOTORESIST
摘要
申请公布号
KR100591133(B1)
申请公布日期
2006.06.12
申请号
KR20040106152
申请日期
2004.12.15
申请人
DONGBU ELECTRONICS CO., LTD.
发明人
JANG, JEONG YEL;KWAK, SUNG HO
分类号
H01L21/3065;H01L21/28;H01L21/312;H01L21/336
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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