Systeem voor het meten van aberratie, werkwijze om aberratie te meten en werkwijze om een halfgeleiderinrichting te vervaardigen.

摘要

A method for measuring aberration includes: measuring a first optical property of a projection optical system before mounting the projection optical system to an exposure apparatus; mounting the projection optical system to the exposure apparatus; measuring a second optical property of the projection optical system after mounting the projection optical system to the exposure apparatus; and determining an amount of aberration of the projection optical system based on the first and second optical property.