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发明名称
METHOD FOR FORMING A HIGH REFLECTIVITY FILM IN A SEMICONDUCTOR EXPOSURE PROCESS
摘要
申请公布号
KR100588649(B1)
申请公布日期
2006.06.12
申请号
KR20030006884
申请日期
2003.02.04
申请人
发明人
分类号
H01L21/027;H01L21/08
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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Stelleinrichtung
