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发明名称
GAS NOZZLE OF PLASMA PROCESS CHAMBER
摘要
申请公布号
KR100586639(B1)
申请公布日期
2006.06.08
申请号
KR20050097151
申请日期
2005.10.14
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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