发明名称 PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON INGOT
摘要 <p>A process in which a polycrystalline silicon ingot improved in life time characteristics, which are correlated with the conversion efficiency of solar wafers, is inexpensively produced by the ordinary-pressure hydrogen-atmosphere melt method. In the process, the generation of oxygen and impurities in the silicon melt is inhibited and light-element impurities are removed through reaction or crystallization. Fine crystal grains can be grown at a high rate, and a high-purity polycrystalline silicon ingot having a crystal structure reduced in crystal defect can be grown. A silicon raw material is melted in an atmosphere of 100% hydrogen at ordinary pressure or an elevated pressure to prepare a silicon melt and simultaneously dissolve hydrogen in the silicon melt. The silicon melt containing hydrogen dissolved therein is solidified. Thereafter, the solid is held at a high temperature around the solidification temperature to grow silicon crystal grains in the solid phase and thereby obtain a polycrystalline silicon ingot.</p>
申请公布号 WO2006059632(A1) 申请公布日期 2006.06.08
申请号 WO2005JP21969 申请日期 2005.11.30
申请人 SPACE ENERGY CORPORATION;NORITAKE TCF CO., LTD.;KIMURA, YOSHIMICHI;SAKAI, YUICHI 发明人 KIMURA, YOSHIMICHI;SAKAI, YUICHI
分类号 C01B33/02 主分类号 C01B33/02
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