发明名称 |
PULSE MODULATOR, LITHOGRAPHY EQUIPMENT, AND DEVICE MANUFACTURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pulse modulator for reducing change to the property of an incident radiation ray beam. <P>SOLUTION: There is provided a pulse modulator constituted such that the input pulse of radiation ray is received along a first optical axis and constituted such that one or more corresponding output pulses of the radiation ray are emitted along a second optical axis. The pulse modulator comprises a divider arranged along the first optical axis and constituted such that the input pulse is divided into a first pulse portion and a second pulse portion and the first pulse portion is conducted along the second optical axis, and first and second mirrors having a predetermined curvature radius, being arranged to face with each other with a predetermined separation space therebetween, and being constituted such that the second pulse portion is received and the second portion is turned along the second optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006148115(A) |
申请公布日期 |
2006.06.08 |
申请号 |
JP20050332328 |
申请日期 |
2005.11.17 |
申请人 |
ASML NETHERLANDS BV;ASML HOLDINGS NV |
发明人 |
BOTMA HAKO;BRUEBACH JOERG;TRENTELMAN MARK;JOOBEUR ADEL |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|