发明名称 PULSE MODULATOR, LITHOGRAPHY EQUIPMENT, AND DEVICE MANUFACTURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a pulse modulator for reducing change to the property of an incident radiation ray beam. <P>SOLUTION: There is provided a pulse modulator constituted such that the input pulse of radiation ray is received along a first optical axis and constituted such that one or more corresponding output pulses of the radiation ray are emitted along a second optical axis. The pulse modulator comprises a divider arranged along the first optical axis and constituted such that the input pulse is divided into a first pulse portion and a second pulse portion and the first pulse portion is conducted along the second optical axis, and first and second mirrors having a predetermined curvature radius, being arranged to face with each other with a predetermined separation space therebetween, and being constituted such that the second pulse portion is received and the second portion is turned along the second optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006148115(A) 申请公布日期 2006.06.08
申请号 JP20050332328 申请日期 2005.11.17
申请人 ASML NETHERLANDS BV;ASML HOLDINGS NV 发明人 BOTMA HAKO;BRUEBACH JOERG;TRENTELMAN MARK;JOOBEUR ADEL
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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