| 摘要 |
PROBLEM TO BE SOLVED: To provide a new rinsing liquid for manufacturing high-quality products by modifying the surface of a resist pattern to have≥70°contact angle and rapidly and effectively preventing pattern collapse in a process of forming a resist pattern by lithography techniques. SOLUTION: The rinsing liquid for lithography comprises a solution containing (A) a water-soluble fluorine compound and (B) an organosilane compound. COPYRIGHT: (C)2006,JPO&NCIPI |
