发明名称 |
Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same |
摘要 |
Disclosed are a composition for removing photoresist, a method of removing photoresist and a method of manufacturing a semiconductor device using a composition. The composition may include a ketone compound and a first polar aprotic solvent. The composition may also include the ketone compound and a second polar aprotic solvent. Moreover, the composition may include the first polar aprotic solvent and a second polar aprotic solvent with or without the ketone compound. The first polar aprotic solvent has at least one of an ether compound and an ester compound, and the second polar aprotic solvent has at least one of a sulfur-containing compound and a nitrogen-containing compound.
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申请公布号 |
US2006122084(A1) |
申请公布日期 |
2006.06.08 |
申请号 |
US20050296000 |
申请日期 |
2005.12.06 |
申请人 |
PARK JUNG-DAE;LEE SANG-EON;CHON SANG-MUN;LEE YANG-KOO;HEO DONG-CHUL;JUN PIL-KWON |
发明人 |
PARK JUNG-DAE;LEE SANG-EON;CHON SANG-MUN;LEE YANG-KOO;HEO DONG-CHUL;JUN PIL-KWON |
分类号 |
C11D7/32 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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