System for detecting metal content on a semiconductor surface and method of operating the same

摘要

An apparatus for detecting the presence of metal material in a semiconductor wafer. The apparatus comprises: (i) a current-carrying coil for generating a first magnetic field, wherein the first magnetic field is capable of causing the metal material in the semiconductor wafer to generate an opposing magnetic field; and (ii) a detection circuit for detecting the opposing magnetic field generated by the metal material when the semiconductor wafer is in proximity to the current-carrying coil.