发明名称 METHOD FOR PRODUCING TARGET FOR FORMING PHASE CHANGE RECORDING FILM WITH WHICH PRESPUTTERING TIME IS SHORTENED
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a target for forming a phase change recording film used for a phase change RAM (Random Access Memory) as one kind of a semiconductor nonvolatile memory with which presputtering time is shortened. <P>SOLUTION: Regarding the method for producing a target for forming a phase change recording film with which presputtering time is shortened, in a method of producing a target for forming a phase change recording film by subjecting raw material powder to pressure sintering, as the raw material powder, gas atomizing powder is used. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006137962(A) 申请公布日期 2006.06.01
申请号 JP20040325844 申请日期 2004.11.10
申请人 MITSUBISHI MATERIALS CORP 发明人 MASHIMA MUNETAKA;KINOSHITA HIROSHI
分类号 C23C14/34;B22F1/00;B22F3/14;B22F9/08;C22C1/04;C22C12/00;H01L27/105 主分类号 C23C14/34
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