发明名称 |
METHOD FOR PRODUCING TARGET FOR FORMING PHASE CHANGE RECORDING FILM WITH WHICH PRESPUTTERING TIME IS SHORTENED |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a target for forming a phase change recording film used for a phase change RAM (Random Access Memory) as one kind of a semiconductor nonvolatile memory with which presputtering time is shortened. <P>SOLUTION: Regarding the method for producing a target for forming a phase change recording film with which presputtering time is shortened, in a method of producing a target for forming a phase change recording film by subjecting raw material powder to pressure sintering, as the raw material powder, gas atomizing powder is used. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006137962(A) |
申请公布日期 |
2006.06.01 |
申请号 |
JP20040325844 |
申请日期 |
2004.11.10 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MASHIMA MUNETAKA;KINOSHITA HIROSHI |
分类号 |
C23C14/34;B22F1/00;B22F3/14;B22F9/08;C22C1/04;C22C12/00;H01L27/105 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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