ION BEAM PROCESSING DEVICE AND MANUFACTURING METHOD OF SAMPLE

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for separating a sample for analysis from a wafer without staining it by such an element as Ga which is problematic to wafer processing. SOLUTION: The ion beam processing device has a vacuum container 41, and the inside of the vacuum container is constructed by a duoplasmatron 81, an ion beam lens 82, and an objective diaphragm 83 or the like. A micro-sample 6 is extracted from a substrate by oxygen ion beam irradiation and a silicon probe 3. COPYRIGHT: (C)2006,JPO&NCIPI