| 摘要 |
The method is capable of easily and securely forming a NiP nonmagnetic film. In the method of forming the NiP nonmagnetic film by electrolytic plating, the electrolytic plating is performed in NiP plating solution consisting of: a reagent for supplying nickel ions; a reagent for supplying phosphorus ions; and a reagent including carboxyl groups. For example, sulfates and chloride salts of nickel, etc. may be use as the reagent for supplying nickel ions; phosphorus acid, sodium phosphite, etc. may be used as the reagent for supplying phosphorus ions.
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