| 摘要 |
A test structure for testing a multidirectional current leakage path. A first doped region of a first conductivity is in the first well of the first conductivity in a substrate, in which the first doped region has a dopant concentration higher than the first well has. A first contact is on the first doped region and contacts the first doped region. The first contact has first and second portions respectively parallel to the first and second directions. A plurality of second doped regions of a second conductivity are in the first well and isolated from the first doped region. In a third direction, the second regions are adjacent to each another and isolate the first portion from the second portion. A plurality of second contacts are on the second doped regions and each one is corresponding to each the second doped region. With a relative shift between the first contact and the second doped region, the partial overlap is used in the test of a multidirectional leakage path.
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