CARBON DOPED OXIDE DEPOSITION

摘要

A METHOD FOR CARBON DOPED OXIDE (CDO) DEPOSITION IS DESCRIBED. ONE METHOD OF DEPOSITION INCLUDES PROVIDING A SUBSTRATE (100) AND INTRODUCING OXYGEN TO A CARBON DOPED OXIDE PRECURSOR IN THE PRESENCE OF THE SUBSTRATE (100). A CARBON DOPED OXIDE FILM IS FORMED ON THE SUBSTRATE (100). IN ANOTHER METHOD THE SUBSTRATE (100) IS PLACED ON A SUSCEPTOR (135) OF A CHEMICAL VAPOR DEPOSITION APPARATUS. A BACKGROUND GAS IS INTRODUCED ALONG WITH THE CARBON DOPED OXIDE PRECURSOR AND OXYGEN TO FORM THE CARBON DOPED OXIDE FILM ON THE SUBSTRATE (100)