| 发明名称 |
Resist composition and method of pattern formation with the same |
| 摘要 |
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
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| 申请公布号 |
EP1662317(A2) |
申请公布日期 |
2006.05.31 |
| 申请号 |
EP20050021201 |
申请日期 |
2005.09.28 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAKAHASHI, HYOU;WADA, KENJI |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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