APPARATUS AND METHOD FOR TREATING SUBSTRATES,申请号KR20040097421-传众专利搜索

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发明名称	APPARATUS AND METHOD FOR TREATING SUBSTRATES
摘要
申请公布号	KR20060058394(A)	申请公布日期	2006.05.30
申请号	KR20040097421	申请日期	2004.11.25
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	CHOI, WOO KYOUNG;LEE, DONG HYUN
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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