发明名称 |
Method for making thin film filter having a negative temperature drift coefficient |
摘要 |
A method for making thin film filters having a negative temperature drift coefficient are the subject of the present invention. Such filters can achieve better optical control within an operational temperature range from -5° C. to 70° C. degrees. A first embodiment of the present invention includes: 1. providing a substrate wafer which has a coefficient of thermal expansion (CTE) greater than that of a selected film stack material; 2. polishing the substrate wafer; 3. depositing thin film layers made of the film stack material on the substrate wafer at a temperature substantially higher than room temperature; 4. cooling the substrate-film stack laminate to room temperature, thus forming a convex-shaped laminate; 5. cutting the cooled laminate into pieces. A second embodiment includes the steps of: 1. providing a laminate composed of a glass substrate and a film stack; 2. using at least one ion beam source to bombard the film stack of the laminate with high energy ions; 3. cutting the bombarded laminate into pieces.
|
申请公布号 |
US7052733(B2) |
申请公布日期 |
2006.05.30 |
申请号 |
US20020044271 |
申请日期 |
2002.01.10 |
申请人 |
HON HAI PRECISION IND. CO., LTD. |
发明人 |
CHEN GA LANE;LEU CHARLES |
分类号 |
B05D5/06;B05D3/12;C03C17/34;G02B1/12;G02B5/28;G02B7/00 |
主分类号 |
B05D5/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|