A method for forming a hard mask for gate electrode patterning and corresponding device,申请号SG20050001362-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	A method for forming a hard mask for gate electrode patterning and corresponding device
摘要
申请公布号	SG121928(A1)	申请公布日期	2006.05.26
申请号	SG20050001362	申请日期	2005.03.04
申请人	TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.	发明人	CHIEN-HAO CHEN;CHIA-JEN CHEN;TZE-LIANG LEE;CHAO-CHENG CHEN;SHIH-CHANG CHEN
分类号		主分类号
代理机构		代理人
主权项
地址

您可能感兴趣的专利

GAS-LIQUID BURNER

THROTTLING DEVICE

UNIT OF END FACE SEALS

DEFERRED BILLING, BROADCAST, ELECTRONIC DOCUMENT DISTRIBUTION SYSTEM AND METHOD

HIGH STABILITY AND LOW METALS ESTERS BASED ON 3,5,5-TRIMETHYL-1-HEXANOL

IMPROVEMENTS RELATING TO MOBILE PHONES

RECLINING OFFICE CHAIR

LIQUID NUTRITIONAL PRODUCT CONTAINING IMPROVED STABILIZER COMPOSITION

ATOMISER HEAD FOR LIQUIDS AND A DEVICE FOR SPRAYING WORKPIECES WITH LIQUIDS USING ATOMISER HEADS OF SAID TYPE

SPECTRAL ANALYSER AND DIRECTION INDICATOR

INTERNET ANSWERING MACHINE

APPARATUS AND METHOD FOR IMPLANTING OPTICAL FIBERS IN FABRIC PANELS AND THE LIKE

CABLE JOINT FOR OPTICAL FIBRES WITH SPLICING CASSETTES AND OVERLENGTH LOOPS

METHODS AND COMPOSITIONS FOR PRODUCING MORPHOGEN ANALOGS

ROOF-COVERING ELEMENT

ABSORBENT ARTICLE HAVING AN ADJUSTMENT SYSTEM

COMPOSITION OF ALKOHOLIC BEVERAGE

Inrichting voor het aangeven van resterende batterij-energie.

METHOD OF FIXING SCREEN-SHAPED COVERING TO A BASE