发明名称 |
A method of patterning a substrate |
摘要 |
<p>A method of patterning a substrate includes forming a liquid film on the substrate surface and directing laser energy from a laser through the film to etch the substrate surface. Etched material is carried away from the substrate surface via evaporation of the film during the etching. The liquid film may be formed on the substrate surface by jetting a liquid vapor onto the substrate.</p> |
申请公布号 |
SG121697(A1) |
申请公布日期 |
2006.05.26 |
申请号 |
SG20010006587 |
申请日期 |
2001.10.25 |
申请人 |
DATA STORAGE INSTITUTE |
发明人 |
WENDONG SONG;MINGHUI HONG;YONGFENG LU |
分类号 |
H01L21/306;B23K26/12;B23K26/14;C03C17/23;C23F1/24;H01L21/311 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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