发明名称 TREATMENT LIQUID SUPPLY APPARATUS, SUBSTRATE TREATMENT APPARATUS AND TREATMENT LIQUID PREPARATION METHOD
摘要 <p>In a treatment liquid supply apparatus, a chemical liquid and pure water are mixed with each other in a mixing portion to prepare a treatment liquid thereby, which is supplied to a substrate as an object to be treated. By means of a constant-flow pump provided in a chemical liquid supply tube, a flow rate of the chemical liquid flowing into the mixing portion is controlled. By means of constant-flow valves provided in treatment liquid supply tubes respectively, flow rates of the treatment liquid flowing from treatment liquid supply portions to the substrate are controlled. Due to this control, a concentration of the chemical liquid in the treatment liquid is controlled to a predetermined value.</p>
申请公布号 WO2006054669(A1) 申请公布日期 2006.05.26
申请号 WO2005JP21174 申请日期 2005.11.11
申请人 ATOH, KOJI;EBARA CORPORATION 发明人 ATOH, KOJI
分类号 B01F15/04;B01J4/00;H01L21/304 主分类号 B01F15/04
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