发明名称 POLYMER OF SILANE COMPOUND, COMPOSITION FOR FORMATION OF ADHESION LAYER, METHOD FOR PRODUCING ADHESION LAYER, ADHESION LAYER AND METHOD FOR PRODUCING SUBSTRATE HAVING INSULATING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a substrate having an insulating film, capable of sufficiently covering the substrate with the insulating film. SOLUTION: The polymer is obtained by polycondensing a compound selected from a group consisting of silane compounds represented by formula (1) (wherein R<SP>1</SP>is a hydrogen atom, a 1-4C alkyl group or a 6-20C aryl group; R<SP>2</SP>is a 1-4C alkyl group or a 6-20C aryl group; R<SP>3</SP>is a 1-4C alkyl group or a 6-20C aryl group; R<SP>4</SP>is a 1-4C alkyl group, a 1-4C acyl group or a 6-20C aryl group; X is a divalent group; m is 2 or 3), formula (2) (wherein R<SP>3</SP>, R<SP>4</SP>, X and m are each the same as mentioned above; R<SP>5</SP>is a hydrogen atom or monovalent organic group; R<SP>6</SP>is monovalent organic group) and formula (3) (wherein R<SP>3</SP>, R<SP>4</SP>, X and m are each the same as mentioned above; R<SP>7</SP>is a 3-8C alkylene group). The method for producing the substrate having the insulating film comprises a step for producing an adhesion layer by applying a composition for formation of the adhesion layer containing an organic solvent onto the substrate and heating the composition and a step for forming an insulating film by applying a composition for formation of the insulating film onto the adhesion layer and heating the composition. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006131863(A) 申请公布日期 2006.05.25
申请号 JP20040375930 申请日期 2004.12.27
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SATO HISAYA;YOSHIDA YUJI
分类号 C08G77/26;C09D5/00;C09D5/25;C09D183/08;H01L21/312 主分类号 C08G77/26
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