发明名称 Lithographischer Projektionsapparat
摘要 In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
申请公布号 DE60118669(D1) 申请公布日期 2006.05.24
申请号 DE2001618669 申请日期 2001.08.23
申请人 ASML NETHERLANDS B.V., VELDHOVEN 发明人 MOORS, JOHANNES HUBERTUS JOSEPHINA;BANINE, VADIM YEVGENYEVICH;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;WERIJ, HENRI GERARD CATO;VISSER, HUGO MATTHIEU;HEERENS, GERRIT-JAN;HAM, ERIK LEONARDUS;MEILING, HANS;LOOPSTRA, EROK ROELOF;DONDERS, SJOERD NICOLAAS LAMBERTUS
分类号 G03F1/14;G03F7/20;H01L21/027;H01L21/673;H01L21/677 主分类号 G03F1/14
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