An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement. Overlay metrology and exposure may be done in parallel.
申请公布号
EP1659452(A1)
申请公布日期
2006.05.24
申请号
EP20050257154
申请日期
2005.11.21
申请人
ASML NETHERLANDS B.V.
发明人
DEN BOEF, ARIE JEFFREY;BURGHOORN, JACOBUS;DUSA, MIRCEA;KIERS, ANTOINE GASTON MARIE;VAN DER SCHAAR, MAURITS
