发明名称 COMPOSITION AND METHOD
摘要 Compositions useful in the preparation of porous organic polysilica films, particularly for use in the manufacture of integrated circuits, are provided. Methods of forming such compositions and films are also provided.
申请公布号 KR20060051080(A) 申请公布日期 2006.05.19
申请号 KR20050083228 申请日期 2005.09.07
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 发明人 PROKOPOWICZ GREGORY P.;GALLAGHER MICHAEL K.
分类号 C08L33/08;C08L83/04;H01L21/20 主分类号 C08L33/08
代理机构 代理人
主权项
地址