| 摘要 |
<p>A lithographic projection apparatus is disclosed. The apparatus includes an illumination system (IL) configured to condition a beam of radiation (PB), and a support structure (MT) configured to support a patterning device (MA). The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table (WT) configured to hold a substrate (W), a projection system (PL) configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system (10) configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device (12,14,16,18) configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.</p> |
