| 摘要 |
PROBLEM TO BE SOLVED: To provide a practical clean room facility and a method for controlling a clean room pressure in order to control changes in the machined size of a semiconductor integrated circuit. SOLUTION: In the clean room facility, a series of circulation paths are formed to cause circulation of air through the underfloor parts 15A, 15B, circumferential parts 16A, 16B, and ceiling parts 17A, 17B of the clean room and a required amount of fresh air is taken in by an outdoor air conditioner 18 to process fresh air load to supply the air into the interiors 10A, 10B of the clean room. The interiors 10A, 10B of the clean room are divided by partitions into a plurality of spaces. The clean room facility includes an air pressure sensor 21 installed in one 10A of the plurality of spaces and means 20A, 22 for controlling the absolute air pressure in the one space to within a predetermined range according to an output signal coming from the air pressure sensor 21. COPYRIGHT: (C)2006,JPO&NCIPI |
