| 摘要 |
PROBLEM TO BE SOLVED: To provide depositing equipment capable of improving the in-plane uniformity of a film thickness drastically. SOLUTION: The depositing equipment comprises a treatment vessel 24 capable of being vacuumed, a mounting stand 26 prepared in the treatment vessel in order to mount a workpiece W, a gas supplying means 60 for supplying a designated gas including gas for deposition in the treatment vessel, a plasma forming means 40 for generating plasma in the treatment vessel, a heating means 88 for heating the workpiece, and a control means 108 for controlling the movement of the entire equipment. An auxiliary heating means 94 is prepared at the periphery of the upper surface of the mounting stand through a clearance by slightly separating the heating means from the periphery of the workpiece. COPYRIGHT: (C)2006,JPO&NCIPI
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